Etch Hard Mask Film
Etch Hard Mask Film용 재료는 소자의 미세화에 따라 미세패턴 구현을 위해 도입된 Hard Mask용 ACL(Amorphous Carbon Layer : 비정질 탄소박막) Precursors입니다.
(주)디엔에프의 ACL Precursors인 1-Hexene과 Propylene은 탄소 함유량이 높아 Etch Resistance가 우수하기 때문에 미세패턴 구현이 용이합니다.
| Product |
Structure |
Property |
MSDS |
| 1-Hexene |
 |
Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity |
: C6H12
: 84.16g/mol
: 60~66℃
: 21℃/155torr
: Colorless liquid
: Stable |
|
| Propylene |
 |
Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity |
: C3H6
: 42.08g/mol
: -47℃
: 37℃/15.4atm
: Colorless Gas
: Stable |
|
| 4MS |
|
Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
|
: C4H12Si
: 88.22g/mol
: 26~28℃
: -
: Colorless liquid
: Stable
|
|
| 3MS |
|
Molecular Formula
Molecular Weight
Boiling Point
Vapor Pressure
Physical State/Color
Water Reactivity
|
: C3H10Si
: 74.20g/mol
: 6.7℃
: -
: Colorless Gas
: Stable
|
|
