¹ÝµµÃ¼ ¼ÒÀÚÀÇ ¹Ì¼¼È¿¡ µû¶ó MetalÀÇ ÁõÂø¹æ¹ýÀÌ PVD(Physical Vapor Deposition)¿¡¼ CVD (Chemical Vapor Deposition) ¹× ALD(Atomic Layer Deposition)¹æ¹ýÀ¸·Î ÀüȯµÇ¸é¼ Àç·á ¶ÇÇÑ º¯È°¡ ¿ä±¸µÇ¾ú½À´Ï´Ù. Alpis-3¿Í MABOCÀº ±×·¯ÇÑ º¯È¿ä±¸¿¡ µû¶ó µð¿£¿¡ÇÁ°¡ °³¹ßÇÑ CVD/ALD¿ë Àü±¸Ã¼ÀÔ´Ï´Ù. ¡Ø Metallization Metal MaterialsÀÇ º¯È : W(Resistivity 8.0 μΩ-cm) → Al(2.7 μΩ-cm) → Cu(1.7 μΩ-cm) ¡Ø Metal Deposition ¹æ½ÄÀÇ º¯È : PVD → CVD → ALD